DIFFUSION OF VANADIUM, CHROMIUM, AND MANGANESE IN COPPER

被引：53

作者：

HOSHINO, K

IIJIMA, Y

HIRANO, KI

机构：

[1] SUMITOMO MET MIN CO LTD,CENT RES LAB,ICHIKAWA,JAPAN

[2] TOHOKU UNIV,FAC ENGN,DEPT MAT SCI,SENDAI,MIYAGI 980,JAPAN

来源：

METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1977年 / 8卷 / 03期

关键词：

D O I：

10.1007/BF02661758

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：469 / 472

页数：4

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[3]

Butrymowicz D. B., 1975, Journal of Physical and Chemical Reference Data, V4, P177, DOI 10.1063/1.555516

[4]

Butrymowicz D. B., 1976, Journal of Physical and Chemical Reference Data, V5, P103, DOI 10.1063/1.555528

[5]

BUTRYMOWICZ DB, 1974, J PHYS CHEM REF DATA, V2, P643

[6]

FOGELSON RL, 1973, IZV VYSSH UCHEBN ZAV, V9, P136

[7]

Gruzin P.L., 1952, DOKL AKAD NAUK SSSR, V86, P289

[8] DIFFUSION OF MANGANESE IN SINGLE CRYSTALS OF COPPER [J].

IKUSHIMA, A .

[9]

LUNDY TS, T TMS AIME, V242, P1897

MACKLIET, CA .

PHYSICAL REVIEW, 1958, 109 (06) :1964-1970