SENSITIVITY OF HOLOGRAM RECORDING IN PHOTOREFRACTIVE MEDIA

被引:1
作者
BLOTEKJAER, K [1 ]
机构
[1] IBM CORP,RES LAB,SAN JOSE,CA 95193
关键词
D O I
10.1063/1.324237
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:3995 / 3996
页数:2
相关论文
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[1]   IMPROVED ELECTROOPTIC MATERIALS AND FIXING TECHNIQUES FOR HOLOGRAPHIC RECORDING [J].
AMODEI, JJ ;
STAEBLER, DL ;
PHILLIPS, W .
APPLIED OPTICS, 1972, 11 (02) :390-&
[2]   HIGH-VOLTAGE BULK PHOTOVOLTAIC EFFECT AND THE PHOTOREFRACTIVE PROCESS IN LINBO3 [J].
GLASS, AM ;
LINDE, DVD ;
NEGRAN, TJ .
APPLIED PHYSICS LETTERS, 1974, 25 (04) :233-235
[3]   STUDY OF EQUIVALENT ELECTRON-DRIFT FIELD CHARACTERISTICS IN LINBO3 BY PHASE HOLOGRAPHY [J].
KIM, DM ;
SHAH, RR ;
RABSON, TA ;
TITTEL, FK .
APPLIED PHYSICS LETTERS, 1976, 29 (02) :84-86
[4]   VOLUME HOLOGRAPHIC RECORDING AND STORAGE IN FE-DOPED LINBO3 USING OPTICAL PULSES [J].
SHAH, P ;
RABSON, TA ;
TITTEL, FK ;
GAYLORD, TK .
APPLIED PHYSICS LETTERS, 1974, 24 (03) :130-131
[5]   FE-DOPED LINBO3 FOR READ-WRITE APPLICATIONS [J].
STAEBLER, DL ;
PHILLIPS, W .
APPLIED OPTICS, 1974, 13 (04) :788-794
[6]   CALCULATION OF DIFFRACTION EFFICIENCY IN HOLOGRAM GRATINGS ATTENUATED ALONG DIRECTION PERPENDICULAR TO GRATING VECTOR [J].
UCHIDA, N .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (03) :280-287