RESOLUTION LIMIT OF NEGATIVE ELECTRON RESIST EXPOSED ON A THIN-FILM SUBSTRATE

被引：16

作者：

TAMAMURA, T

SUKEGAWA, K

SUGAWARA, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期

关键词：

D O I：

10.1149/1.2124303

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1831 / 1835

页数：5

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