OUTDIFFUSION OF SI THROUGH GOLD-FILMS - THE EFFECTS OF SI ORIENTATION, GOLD DEPOSITION TECHNIQUES AND RATES, AND ANNEALING AMBIENTS

被引：43

作者：

CHANG, CA ^{[1
]}

OTTAVIANI, G ^{[1
]}

机构：

[1] INST FIS,MODENA,ITALY

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 09期

关键词：

D O I：

10.1063/1.94928

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：901 / 903

页数：3

共 16 条

[1] COMPETING AMBIENT EFFECTS ON THE INTER-DIFFUSION IN PT/NI/AL FILMS [J].

CHANG, CA .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :7088-7091

[2] INTERACTION IN CU-AL AND PT/CU/AL THIN-FILMS - COMPETING OXYGEN EFFECTS AND PREFERENTIAL REACTION BETWEEN PT AND CU-AL ALLOY [J].

CHANG, CA .

APPLIED PHYSICS LETTERS, 1984, 44 (03) :310-312

[3] AMBIENT EFFECTS ON THE DIFFUSION OF CR AND SI IN THIN PT FILMS [J].

CHANG, CA ;

CHU, WK .

APPLIED PHYSICS LETTERS, 1980, 37 (02) :161-162

[4] EFFECT OF CO ON THE LOW-TEMPERATURE DIFFUSION OF CR AND SI THROUGH THIN GOLD-FILMS [J].

CHANG, CA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) :1331-1334

[5] ANNEALING AMBIENT - A USEFUL PROBE FOR INTERFACE INTERACTIONS IN THIN-FILMS [J].

CHANG, CA .

APPLIED PHYSICS LETTERS, 1981, 38 (11) :860-862

[6] REDUCED CU-CR MIXING AND REDUCED PT-CU INTER-DIFFUSION BY OXYGEN IN CU/CR AND PT/CU/CR THIN-FILMS [J].

CHANG, CA .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :7092-7094

[7] SIMILARITY IN INTERACTIONS BETWEEN METAL-SEMICONDUCTOR AND METAL METAL INTERFACES [J].

CHANG, CA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :639-643

[8] EFFECT OF OXYGEN ON THE DIFFUSION OF AL IN PT FILMS [J].

CHANG, CA .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (07) :4620-4622

[9] EFFECT OF OXYGEN ON THE DIFFUSION OF NI IN PT IN PT-NI-PT FILMS [J].

CHANG, CA ;

CHU, WK .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :512-514

[10] AMBIENT EFFECTS ON THE OUT-DIFFUSION OF GAAS THROUGH THIN GOLD-FILMS [J].

CHANG, CA ;

CHOU, NJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06) :1358-1359

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