FUNDAMENTAL PROPERTIES OF RADIOFREQUENCY AND MICROWAVE SURFACE-WAVE INDUCED PLASMAS

被引：23

作者：

BESNER, A ^{[1
]}

MOISAN, M ^{[1
]}

HUBERT, J ^{[1
]}

机构：

[1] UNIV MONTREAL,DEPT CHIM,POB 6128,STN A,MONTREAL H3C 3J7,QUEBEC,CANADA

来源：

JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY | 1988年 / 3卷 / 06期

关键词：

D O I：

10.1039/ja9880300863

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：863 / 866

页数：4

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[7] ON THE SUPPLY AND MEASUREMENT OF POWER IN MICROWAVE INDUCED PLASMAS [J].

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[8]

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