ETCH-INDUCED MOS GUARD-RING-PROTECTED SCHOTTKY-BARRIER DIODES

被引:3
|
作者
SREENATH, RN [1 ]
CHANDRA, MM [1 ]
SURYAN, G [1 ]
机构
[1] INDIAN INST SCI, DEPT PHYS, BANGALORE 560012, KARNATAKA, INDIA
来源
关键词
SEMICONDUCTOR DEVICES; MOS - SEMICONDUCTOR DEVICES; SCHOTTKY BARRIER;
D O I
10.1049/ip-i-1.1984.0018
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple technique for the fabrication of Schottky-barrier diodes with near ideal characteristics is discussed. The fabrication employs a two mask process with an isotropic etching step to round off the corners of the metallurgical junction. A self-aligned MOS guard ring is also incorporated, the use of which is optional.
引用
收藏
页码:63 / 65
页数:3
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