INFRARED-SPECTROSCOPY OF SI(111) AND SI(100) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY

被引：647

作者：

CHABAL, YJ ^{[1
]}

HIGASHI, GS ^{[1
]}

RAGHAVACHARI, K ^{[1
]}

BURROWS, VA ^{[1
]}

机构：

[1] ARIZONA STATE UNIV,TEMPE,AZ 85287

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575980

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2104 / 2109

页数：6

共 23 条

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