PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2 FILM USING DIRECT EXCITATION PROCESS BY DEUTERIUM LAMP

被引:43
|
作者
OKUYAMA, M
TOYODA, Y
HAMAKAWA, Y
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 02期
关键词
D O I
10.1143/JJAP.23.L97
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L97 / L99
页数:3
相关论文
共 50 条
  • [41] ANALYTICAL MODEL FOR THE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SIO2 FROM TETRAETHOXYSILANE
    KALIDINDI, SR
    DESU, SB
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) : 624 - 628
  • [42] PHOTOLUMINESCENCE AND ITS EXCIMER-LASER IRRADIATION EFFECTS IN SIO2 FILM PREPARED BY PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITION
    KANASHIMA, T
    OKUYAMA, M
    HAMAKAWA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1993, 32 (6B): : 3113 - 3119
  • [43] SiO2/InP structure prepared by direct photo-chemical vapor deposition using deuterium lamp and its applications to metal-oxide-semiconductor field-effect transistor
    Shei, Shih-Chang
    Su, Yan-Kuin
    Hwang, Chih-Jen
    Yokoyama, Meiso
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (2 A): : 476 - 481
  • [44] SiO2 deposition approaches using catalytic chemical-vapor deposition method
    Matsumoto, Yasuhiro
    Reyes, Mario A.
    Escobosa, Arturo
    Journal of Applied Physics, 2005, 98 (01):
  • [45] Chemical vapor deposition of Ge nanocrystals on SiO2
    Baron, T
    Pelissier, B
    Perniola, L
    Mazen, F
    Hartmann, JM
    Rolland, G
    APPLIED PHYSICS LETTERS, 2003, 83 (07) : 1444 - 1446
  • [46] Direct Synthesis of Graphene Dendrites on SiO2/Si Substrates by Chemical Vapor Deposition
    Yingxian Li
    Zhenhua Li
    Qingbo Li
    Meng Tian
    Chunhui Li
    Li Sun
    Jihua Wang
    Xian Zhao
    Shicai Xu
    Fapeng Yu
    Nanoscale Research Letters, 2020, 15
  • [47] Direct Synthesis of Graphene Dendrites on SiO2/Si Substrates by Chemical Vapor Deposition
    Li, Yingxian
    Li, Zhenhua
    Li, Qingbo
    Tian, Meng
    Li, Chunhui
    Sun, Li
    Wang, Jihua
    Zhao, Xian
    Xu, Shicai
    Yu, Fapeng
    NANOSCALE RESEARCH LETTERS, 2020, 15 (01):
  • [48] Deposition of diamond films on SiO2 surface using high power microwave enhanced chemical vapor deposition process
    Lee, JS
    Liu, KS
    Lin, IN
    IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 1996, : 436 - 440
  • [49] Deposition of diamond films on SiO2 surfaces using a high power microwave enhanced chemical vapor deposition process
    Lee, JS
    Liu, KS
    Lin, IN
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) : 486 - 491
  • [50] DIFFERENCES IN THE SIO2/INP INTERFACES OBTAINED BY THERMAL AND UV-INDUCED CHEMICAL VAPOR-DEPOSITION
    LICOPPE, C
    DEBAUCHE, C
    HOUZAY, F
    FLICSTEIN, J
    NISSIM, YI
    MOISON, JM
    APPLIED SURFACE SCIENCE, 1992, 56-8 : 789 - 794