PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2 FILM USING DIRECT EXCITATION PROCESS BY DEUTERIUM LAMP

被引：43
|
作者：
OKUYAMA, M
TOYODA, Y
HAMAKAWA, Y
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 02期
关键词：
D O I：
10.1143/JJAP.23.L97
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L97 / L99
页数：3
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