AUGER EXAMINATION OF CONTAMINANTS IN THIN-FILM METALLIZATIONS

被引：5

作者：

THOMAS, RE ^{[1
]}

HAAS, GA ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 02期

关键词：

D O I：

10.1063/1.321628

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：963 / 965

页数：3

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