AUGER EXAMINATION OF CONTAMINANTS IN THIN-FILM METALLIZATIONS

被引：5
|
作者：
THOMAS, RE [1 ]
HAAS, GA [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 02期
关键词：
D O I：
10.1063/1.321628
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：963 / 965
页数：3
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