SPATIAL VARIATIONS OF RADIO-FREQUENCY PLASMA-DENSITY CAUSED BY A STEP-CHANGE OF SECONDARY-ELECTRON EMISSION COEFFICIENT

被引：5

作者：

XU, WL

SIDES, PJ

机构：

[1] Department of Chemical Engineering, Carnegie Mellon University, Pittsburgh

来源：

JOURNAL OF APPLIED PHYSICS | 1995年 / 77卷 / 09期

关键词：

D O I：

10.1063/1.359452

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A two-dimensional analytical model for the effect of a nonuniform secondary electron emission coefficient (γ) on the powered electrode of a radio frequency plasma was developed. The nonuniformity was a step change in the value of γ. The ambipolar diffusion equation, including ionization by thermal and secondary electrons, took the form of a Helmholtz equation for which the solution by separation of variables was a series of cosine functions. The discontinuity of γ on the electrode engendered substantial nonuniformity of plasma density. For example, the nonuniformity at the sheath edge of an Ar plasma (50 mTorr, 200 V) was 40% for a substrate having a γ of 0.027 and resting on a platen having a γ of 1.00. © 1995 American Institute of Physics.

引用

页码：4293 / 4301

页数：9

共 33 条

[21] INFLUENCE OF SECONDARY-ELECTRON EMISSION COEFFICIENT OF ARGON ON PASCHEN BREAKDOWN CURVES IN AC PLASMA PANELS FOR NEON + 0.1 PERCENT ARGON MIXTURE
SAHNI, O
LANZA, C
JOURNAL OF APPLIED PHYSICS, 1976, 47 (11) : 5107 - 5108
[22] High emission current density microwave-plasma-grown carbon nanotube arrays by postdepositional radio-frequency oxygen plasma treatment
Chen, Z
den Engelsen, D
Bachmann, PK
van Elsbergen, V
Koehler, I
Merikhi, J
Wiechert, DU
APPLIED PHYSICS LETTERS, 2005, 87 (24) : 1 - 3
[23] Effect of radio-frequency power levels on electron density in a confined two-frequency capacitively-coupled plasma processing tool
Karkari, SK
Ellingboe, AR
APPLIED PHYSICS LETTERS, 2006, 88 (10)
[24] Plasma density, electron temperature, excited xenon density and ion-induced secondary electron emission coefficient for the vacuum ultraviolet luminous efficiency in an alternating current plasma display panel
Choi, Eun Ha
Oh, Philyong
Hong, Byoung Hee
Kim, Yun Ki
Park, Byung Joo
Seo, Yoonho
Cho, Guangsup
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (03) : 951 - 955
[25] Determining the 2D spatial distribution of plasma parameters in a cylindrical cross section of a radio-frequency ion thruster by optical emission spectroscopy
Felix Becker
Pascal Sarnoch
Kristof Holste
Hans Leiter
Peter J. Klar
Journal of Electric Propulsion, 4 (1):
[26] Effects of secondary electron emission on plasma density and electron excitation dynamics in dual-frequency asymmetric capacitively coupled argon plasmas
Liu, Gang-Hu
Wang, Xiang-Yu
Liu, Yong-Xin
Sun, Jing-Yu
Wang, You-Nian
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2018, 27 (06):
[27] On the in-situ determination of the effective secondary electron emission coefficient in low pressure capacitively coupled radio frequency discharges based on the electrical asymmetry effect
Masheyeva, Ranna
Hartmann, Peter
Luo, Lan-Yue
Dzhumagulova, Karlygash
Liu, Yong-Xin
Schulze, Julian
Donko, Zoltan
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2025, 58 (04)
[28] Field electron emission properties of the carbon nanotube emitter device produced through radio-frequency plasma-enhanced chemical vapor deposition at low temperature
Migita, T.
Shiratori, Y.
Kishino, T.
Takeuchi, Y.
PROCEEDINGS OF THE TWENTY-FIFTH INTERNATIONAL DISPLAY RESEARCH CONFERENCE - EURODISPLAY 2005, 2005, : 372 - 375
[29] Comment on "The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor" [J. Appl. hys. 102, 113302 (2007)]
Du, M. Q.
Ding, Z. F.
JOURNAL OF APPLIED PHYSICS, 2022, 132 (15)
[30] Excited xenon density and ion-induced secondary electron emission coefficient for vacuum ultraviolet luminous efficiency in alternating current plasma display panel
Choi, Eun Ha
Oh, Philyong
Hong, Byoung Hee
Kim, Yun Ki
Park, Byoung Joo
Cho, Jaewon
Seo, Yoonho
Cho, Guangsup
THIN SOLID FILMS, 2008, 516 (11) : 3601 - 3604

← 1 2 3 4 →