LASER-ASSISTED CHEMICAL VAPOR-DEPOSITION OF SI - LOW-TEMPERATURE (LESS-THAN 600-DEGREES-C) GROWTH OF EPITAXIAL AND POLYCRYSTALLINE LAYERS

被引：18
作者：
SUZUKI, K
LUBBEN, D
GREENE, JE
机构：
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 02期
关键词：
D O I：
10.1063/1.336144
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：979 / 982
页数：4
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