CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES .1. PHASE AND CHEMICAL-COMPOSITION

被引：46

作者：

JANSSON, U

CARLSSON, JO

STRIDH, B

SODERBERG, S

OLSSON, M

机构：

[1] UNIV UPPSALA,DEPT TECHNOL,MAT SCI GRP,S-75121 UPPSALA,SWEDEN

[2] AB SANDVIK COROMANT,S-12612 STOCKHOLM,SWEDEN

来源：

THIN SOLID FILMS | 1989年 / 172卷 / 01期

关键词：

D O I：

10.1016/0040-6090(89)90120-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：81 / 93

页数：13

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[9] CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES IN THE TEMPERATURE-RANGE 1300-1500-K AND AT A REDUCED PRESSURE [J].

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