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- [2] FORMATION OF THERMAL OXIDES OF SILICONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (08) : C209 - C209COOPER, HWEVITTS, HCFLASCHEN, SS
- [3] SEED-FORMATION IN CASE OF VACUUM CONDENSATION ON THERMAL SILICON OXIDESFIZIKA TVERDOGO TELA, 1972, 14 (05): : 1538 - &PROKHORO.VICHERNYAK, VSSOROKIN, LM
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- [5] The Formation and Devitrification of Oxides on SiliconJOURNAL OF MATERIALS SCIENCE, 1966, 1 (01) : 1 - 13Ainger, F. W.
- [6] DIFFUSION OF OXYGEN IN SILICON THERMAL OXIDESJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (10) : 2486 - 2489TAFT, EA
- [7] DEFECTS AND IMPURITIES IN THERMAL OXIDES ON SILICONAPPLIED PHYSICS LETTERS, 1982, 41 (03) : 251 - 253BROWER, KLLENAHAN, PMDRESSENDORFER, PV
- [8] AN OPTICAL CHARACTERIZATION OF NATIVE OXIDES AND THIN THERMAL OXIDES ON SILICONJOURNAL OF APPLIED PHYSICS, 1982, 53 (07) : 5224 - 5229PHILIPP, HRTAFT, EA
- [9] Formation of Oxides Upon Thermal Debinding and Their Role in Obtaining Reaction-Bonded Silicon CarbideJournal of Engineering Physics and Thermophysics, 2023, 96 : 897 - 905P. S. GrinchukM. V. KiyashkoM. O. StepkinA. V. AkulichD. V. SoloveiS. M. Danilova-Tret’yak
- [10] EFFECTS OF RAPID THERMAL-PROCESSING ON THERMAL OXIDES OF SILICONJOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3360 - 3363LEE, SKKWONG, DLALVI, NS