ION-SOURCE WITH PLASMA GENERATION BY MICROWAVES IN ELECTRON-CYCLOTRON RESONANCE

[1] SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS [J]. THIN SOLID FILMS, 1978, 50 (MAY) : 135 - 144

[2] Hammer K., 1982, Experimentelle Technik der Physik, V30, P535

[3] HAMMER K, THESIS TH KARLMARX S

[4] MATERIAL PROCESSING WITH BROAD-BEAM ION SOURCES [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 413 - 439

[5] HECHT G, 1979, THESIS TH KARLMARX S

[6] PLASMA ELECTRON-ENERGY DISTRIBUTION OF A BEAM-PLASMA TYPE ION-SOURCE [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (02): : 309 - 314

[7] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736

[8] PRODUCTION OF QUIESCENT DISCHARGE WITH HIGH ELECTRON TEMPERATURES [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (03) : 295 - &

[9] MEGLA G, 1961, DEZIMETERWELLENTECHN

[10] Mierdel G., 1970, ELEKTROPHYSIK

[1] SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS [J]. THIN SOLID FILMS, 1978, 50 (MAY) : 135 - 144

[2] Hammer K., 1982, Experimentelle Technik der Physik, V30, P535

[3] HAMMER K, THESIS TH KARLMARX S

[4] MATERIAL PROCESSING WITH BROAD-BEAM ION SOURCES [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 413 - 439

[5] HECHT G, 1979, THESIS TH KARLMARX S

[6] PLASMA ELECTRON-ENERGY DISTRIBUTION OF A BEAM-PLASMA TYPE ION-SOURCE [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (02): : 309 - 314

[7] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736

[8] PRODUCTION OF QUIESCENT DISCHARGE WITH HIGH ELECTRON TEMPERATURES [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (03) : 295 - &

[9] MEGLA G, 1961, DEZIMETERWELLENTECHN

[10] Mierdel G., 1970, ELEKTROPHYSIK