GROWTH-KINETICS AND STEP DENSITY IN REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION DURING MOLECULAR-BEAM EPITAXY

被引：158
作者：
CLARKE, S
VVEDENSKY, DD
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 07期
关键词：
D O I：
10.1063/1.341041
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2272 / 2283
页数：12
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