PLASMA-OXIDIZED TUNNEL BARRIER OF NB/NB JOSEPHSON-JUNCTIONS WITH COPPER INTERLAYER

被引：10
|
作者：
NAKAYAMA, A
OKABE, Y
SUGANO, T
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1984年 / 23卷 / 08期
关键词：
D O I：
10.1143/JJAP.23.1007
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1007 / 1010
页数：4
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