共 7 条
[1]
Yen, Ghanbari, Ku, Schattenburg, Carter, Smith, Microelectronic Engineering, 13, (1991)
[2]
Chu, Yen, Ismail, Shepard, Lezec, Musil, Melngailis, Ku, Carter, Smith, Sub-100-nm x-ray mask technology using focused-ion-beam lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7, (1989)
[3]
Georgiu, Janoski, Palumbo, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III, SPIE, 471, (1984)
[4]
Ono, Ozawa, J. Vac. Sci. Technol. B, 2, (1984)
[5]
Suzuki, Matsui, J. Vac. Sci. Technol. B, 4, (1986)
[6]
Glang, Holmwood, Rosenfeld, Rev. Sci. Instrum., 36, (1965)
[7]
Chiu, Acosta, Electrodeposition of low stress gold for x-ray mask, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 8, (1990)