THE INFLUENCE OF IMPLANTED DOPANTS ON STRESSES AND DIFFUSION-PROCESSES IN NIO FILMS DURING THERMAL-OXIDATION OF NI

被引：21
作者：
LOISON, D
PIVIN, JC
CHAUMONT, J
ROQUESCARMES, C
机构：
[1] CTR SPECTROMETRIE NUCL & SPECTROMETRIE MASSE,LAB RENE BERNAS,F-91406 ORSAY,FRANCE
[2] ECOLE NATL SUPER MECAN & MICROTECH,MICROANAL SURFACES LAB,F-25030 BESANCON,FRANCE
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期
关键词：
D O I：
10.1016/0167-5087(83)90908-0
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：975 / 981
页数：7
相关论文
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