STABILITY OF ALIGNMENT MARKS FOR X-RAY MASKS

被引：3

作者：

ACOSTA, RE ^{[1
]}

MALDONADO, JR ^{[1
]}

FAIR, R ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583448

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：240 / 242

页数：3

共 6 条

[1] Acosta R. E., 1985, Microcircuit Engineering 84. International Conference Proceedings, P291
[2] ACOSTA RE, 1983, P SOC PHOTO, V448, P114
[3] AN OPTICAL ALIGNMENT MICROSCOPE FOR X-RAY-LITHOGRAPHY
BOBROFF, N
TIBBETTS, R
WILCZYNSKI, J
WILSON, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 285 - 289
[4] ELECTRON-BEAM PROXIMITY PRINTING - A NEW HIGH-SPEED LITHOGRAPHY METHOD FOR SUB-MICRON STRUCTURES
BOHLEN, H
GRESCHNER, J
KEYSER, J
KULCKE, W
NEHMIZ, P
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) : 568 - 579
[5] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION BORO-HYDRO-NITRIDE FILMS AND THEIR USE IN X-RAY MASKS
DANA, SS
MALDONADO, JR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 235 - 239
[6] WATTS RK, 1982, VLSI ELECTRONICS MIC, V4