MICROPOROSITY AND ADHESION OF ION BOMBARDED THIN SILICON SURFACE-FILMS

被引：19

作者：

ENSINGER, W

BARTH, M

WOLF, GK

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1988年 / 32卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(88)90190-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：104 / 110

页数：7

共 11 条

[1] ION-BEAM BONDING OF THIN-FILMS [J].

BAGLIN, JEE ;

CLARK, GJ .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) :881-885

[2] MEASUREMENT OF ADHESION OF THIN FILMS [J].

BENJAMIN, P ;

WEAVER, C .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1960, 254 (1277) :163-176

[3] ADHESION OF EVAPORATED TITANIUM FILMS TO ION-BOMBARDED POLYETHYLENE [J].

BODO, P ;

SUNDGREN, JE .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (03) :1161-1168

[4] PROPERTY MODIFICATION AND SYNTHESIS BY LOW-ENERGY PARTICLE BOMBARDMENT CONCURRENT WITH FILM GROWTH [J].

CUOMO, JJ ;

ROSSNAGEL, SM .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :963-974

[5]

FERBER H, 1985, P C RAD EFFECTS INSU, V3, P573

[6] MEASUREMENT OF ADHESION OF THIN EVAPORATED FILMS ON GLASS SUBSTRATES BY MEANS OF DIRECT PULL METHOD [J].

JACOBSSON, R ;

KRUSE, B .

THIN SOLID FILMS, 1973, 15 (01) :71-77

[7]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[8]

SOFIELD CJ, 1985, P C RAD EFFECTS INSU, V3, P201

[9] ENHANCEMENT OF ADHESION BY MEGAELECTRONVOLT ION-BOMBARDMENT [J].

TOMBRELLO, TA .

MATERIALS SCIENCE AND ENGINEERING, 1985, 69 (02) :443-447

[10] EQUIPMENT FOR ION-BEAM ASSISTED DEPOSITION [J].

WOLF, GK ;

ZUCHOLL, K ;

BARTH, M ;

ENSINGER, W .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 21 (2-4) :570-573

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