TITANIUM SILICIDE FORMATION ON BF2+-IMPLANTED SILICON

被引：30

作者：

CHOW, TP

KATZ, W

SMITH, G

机构：

[1] GE, Schenectady, NY, USA, GE, Schenectady, NY, USA

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 01期

关键词：

D O I：

10.1063/1.95844

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：41 / 43

页数：3

共 13 条

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