KINETICS OF TITANIUM SILICIDE FORMATION ON SINGLE-CRYSTAL SI - EXPERIMENT AND MODELING

被引:42
作者
PICO, CA
LAGALLY, MG
机构
关键词
D O I
10.1063/1.342445
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4957 / 4967
页数:11
相关论文
共 32 条
[1]   SPECIAL ASPECTS OF DIFFUSION IN THIN-FILMS [J].
BALLUFFI, RW ;
BLAKELY, JM .
THIN SOLID FILMS, 1975, 25 (02) :363-392
[2]  
BARRETT CR, 1973, PRINCIPLES ENG MATER, pCH12
[3]  
BENTINI GG, 1985, J APPL PHYS, V51, P270
[4]   METASTABLE PHASE FORMATION IN TITANIUM-SILICON THIN-FILMS [J].
BEYERS, R ;
SINCLAIR, R .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5240-5245
[5]  
Cherns D., 1981, Defects in Semiconductors. Proceedings of the Materials Research Society Annual Meeting, P291
[6]   LATTICE IMAGING OF METASTABLE TISI2 [J].
CHOU, TC ;
WONG, CY ;
TU, KN .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (06) :2275-2279
[7]  
Crank J, 1956, MATH DIFFUSION
[8]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[9]  
DHEURLE FM, 1987, MATER RES SOC S P, V77, P333
[10]   INTERACTION OF EVAPORATED PALLADIUM AND TITANIUM FILMS WITH SINGLE-CRYSTAL SILICON [J].
FINSTAD, TG ;
NICOLET, MA .
THIN SOLID FILMS, 1980, 68 (02) :393-405