POLYMER FILM FORMATION IN C2F6-H2 DISCHARGES

被引：73

作者：

DAGOSTINO, R

CRAMAROSSA, F

FRACASSI, F

DESIMONI, E

SABBATINI, L

ZAMBONIN, PG

CAPORICCIO, G

机构：

[1] UNIV BARI,DEPARTIMENTO CHIM,CHIM ANALIT LAB,I-70126 BARI,ITALY

[2] CTR R&S MONTEFLUOS,I-20183 MILAN,ITALY

来源：

THIN SOLID FILMS | 1986年 / 143卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90384-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：163 / 175

页数：13

共 27 条

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[8]

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[9] MECHANISMS OF ETCHING AND POLYMERIZATION IN RADIOFREQUENCY DISCHARGES OF CF4-H2,CF4-C2F4,C2F6-H2,C3F8-H2 [J].

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[10]

dAgostino R., 1982, PLASMA CHEM PLASMA P, V2, P213

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