FORMATION OF SHALLOW P(+)-N JUNCTIONS BY B(+) IMPLANTATION THROUGH A TISI2 SCREEN-FILM

被引：0

作者：

BAO, XM

YAN, H

MAO, BH

机构：

[1] NANJING ELECTR DEVICES INST,NANJING,PEOPLES R CHINA

[2] NANJING UNIV,SOLID STATE MICROSTRUCT LAB,NANJING,PEOPLES R CHINA

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1993年 / 137卷 / 01期

关键词：

D O I：

10.1002/pssa.2211370131

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：K21 / K24

页数：4

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