HREM OBSERVATION OF EPITAXIAL AU/SI(111) INTERFACE BY THE 400 KV AARM

被引：0
|
作者：
YOKOTA, Y
SAITO, N
HASHIMOTO, H
ENDOH, H
机构：
[1] JEOL LTD,TOKYO 196,JAPAN
[2] OSAKA UNIV,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN
来源：
JOURNAL OF ELECTRON MICROSCOPY | 1985年 / 34卷 / 03期
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中图分类号：
TH742 [显微镜];
学科分类号：
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页码：230 / 230
页数：1
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