ELECTRICAL ENDPOINT DETECTION OF VLSI CONTACT PLASMA-ETCHING

被引：6
|
作者：
CHANG, G
MCVITTIE, JP
WALKER, JT
DUTTON, RW
机构：
来源：
IEEE ELECTRON DEVICE LETTERS | 1984年 / 5卷 / 12期
关键词：
D O I：
10.1109/EDL.1984.26009
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：514 / 517
页数：4
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