FABRICATION AND RESIST EXPOSURE CHARACTERISTICS OF 50 KEV NANOMETER E-BEAM LITHOGRAPHY SYSTEM

被引：18

作者：

GAMO, K ^{[1
]}

YAMASHITA, K ^{[1
]}

EMOTO, F ^{[1
]}

NAMBA, S ^{[1
]}

SAMOTO, N ^{[1
]}

SHIMIZU, R ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN,SUITA,OSAKA 565,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583191

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：117 / 120

页数：4

共 10 条

[1] SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF [J].

BEAUMONT, SP ;

BOWER, PG ;

TAMAMURA, T ;

WILKINSON, CDW .

APPLIED PHYSICS LETTERS, 1981, 38 (06) :436-439

[2] 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST [J].

BROERS, AN ;

HARPER, JME ;

MOLZEN, WW .

APPLIED PHYSICS LETTERS, 1978, 33 (05) :392-394

[3] 10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS [J].

CRAIGHEAD, HG ;

HOWARD, RE ;

JACKEL, LD ;

MANKIEWICH, PM .

APPLIED PHYSICS LETTERS, 1983, 42 (01) :38-40

[4] INSITU VAPORIZATION OF VERY LOW-MOLECULAR WEIGHT RESISTS USING 1-2 NM DIAMETER ELECTRON-BEAMS [J].

ISAACSON, M ;

MURRAY, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1117-1120

[5] A HIGH-CURRENT, HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY COLUMN [J].

KELLY, J ;

GROVES, T ;

KUO, HP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :936-940

[6] AN E-BEAM MICROFABRICATION SYSTEM FOR NANOLITHOGRAPHY [J].

LEE, KL ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :946-949

[7] HIGH-VOLTAGE ELECTRON LITHOGRAPHY [J].

NEILL, TR ;

BULL, CJ .

ELECTRONICS LETTERS, 1980, 16 (16) :621-623

[8] PERFORMANCE RESULTS OF AN ELECTRON-BEAM LITHOGRAPHY MACHINE AND PROCESS BY MEANS OF DC ELECTRICAL TEST STRUCTURES [J].

RISSMAN, P ;

LIU, ED ;

OWEN, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1014-1019

[9] EXPOSURE AND DEVELOPMENT SIMULATIONS FOR NANOMETER ELECTRON-BEAM LITHOGRAPHY [J].

SAMOTO, N ;

SHIMIZU, R ;

HASHIMOTO, H ;

ADESIDA, I ;

WOLF, E ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1367-1371

[10] A FIELD-EMISSION E-BEAM SYSTEM FOR NANOMETER LITHOGRAPHY [J].

STEPHANI, D ;

KRATSCHMER, E ;

BENEKING, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1011-1013

← 1 →