PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON EPITAXIAL LAYERS

被引：7
作者：
REIF, R
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 10期
关键词：
D O I：
10.1149/1.2115310
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：2430 / 2435
页数：6
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