ION ETCHING FOR PATTERN DELINEATION

被引：95
作者：
MELLIARSMITH, CM [1 ]
机构：
[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 05期
关键词：
D O I：
10.1116/1.569037
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1008 / 1022
页数：15
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