A STUDY ON THE VOLTAMMETRIC BEHAVIOR OF SILVER ON ELECTRODISPERSED PLATINUM-ELECTRODES IN ACID-SOLUTION

被引:16
作者
MARTINS, ME
SALVAREZZA, RC
ARVIA, AJ
机构
[1] Instituto de Investigaciones Fisicoquimicas Teoricas y Aplicadas (INIFTA), Universidad Nacional de La Plata, 1900 La Plata, Sucursal 4
关键词
METAL ELECTRODEPOSITION; ELECTRODE ROUGHNESS; GROWTH MODES; MICROCOLUMNAR STRUCTURED METAL ELECTRODES; POROUS STRUCTURES;
D O I
10.1016/0013-4686(91)85015-Y
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The early stages of Ag electrodeposition on columnar structured Pt electrodes was investigated in acid solutions covering the underpotential deposition (upd) and overpotential deposition (opd) ranges. Results show a remarkable dependence of the Ag growth mode on the electrode roughness and potential sweep rate. At high potential sweep rates and large substrate roughness factors a 3-D to 2-D rearrangement can be detected. This process appears to be also accompanied by a Pt-Ag formation. For this type of electrode, both processes hinder the nucleation and growth of the 3-D Ag phase. Under certain conditions the complete Ag plating of the entire porous structure can be produced and the voltammetric behaviour of the system then approaches that observed for the Ag/Ag+ electrode reaction at an electrochemical thin layer cell.
引用
收藏
页码:1617 / 1622
页数:6
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