SURFACE-STATES AND RECONSTRUCTION OF EPITAXIAL ROOT-3-X-ROOT-3R 30-DEGREES ER SILICIDE ON SI(111)

被引:44
作者
WETZEL, P
SAINTENOY, S
PIRRI, C
BOLMONT, D
GEWINNER, G
机构
[1] Laboratoire de Physique et de Spectroscopie Electronique, Faculté des Sciences et Techniques, 68093 Mulhouse Cedex
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 15期
关键词
D O I
10.1103/PhysRevB.50.10886
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface electronic structure of epitaxial root 3 X root 3R 30 degrees ErSi1.7 layers on Si(111) has been studied by high-resolution angle-resolved ultraviolet photoemission spectroscopy. Typical surface states or resonances are unambiguously identified and their band dispersions mapped along the high-symmetry Gamma ($) over bar M ($) over bar Gamma ($) over bar K ($) over bar, and K ($) over bar M ($) over bar lines of the (1 X 1) surface Brillouin zone. These data are compared to the band structure of two-dimensional p(1 X 1) Er silicide extensively studied in previous works. It is found that the prominent surface bands observed in the 0-3-eV binding-energy range can be readily derived from the p(1 X 1) surface-silicide bands folded back into the reduced root 3 X root 3 zone. This indicates that the bulk silicide is also terminated with a buckled Si layer without vacancies, quite similar to the surface-silicide termination. In particular, specific surface bands reflect the doubly (essentially) occupied dangling bonds and the back bonds of the buckled Si top layer.
引用
收藏
页码:10886 / 10892
页数:7
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