DEPOSITION OF TITANIUM FROM TITANIUM(4) IODIDE UNDER A FLOW SYSTEM

被引：1

作者：

KAGAWA, M ^{[1
]}

OHNO, R ^{[1
]}

机构：

[1] TOHOKU UNIV,RES INST IRON STEEL & OTHER MET,SENDAI 980,JAPAN

来源：

TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS | 1976年 / 17卷 / 03期

关键词：

D O I：

10.2320/matertrans1960.17.117

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：117 / 124

页数：8

共 9 条

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[2] BLOCHER JM, 1970, CHEMICAL VAPOR DEPOS
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BYLANDER, EG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1171 - 1175
[4] THE REACTIONS OF TITANIUM TETRAIODIDE ON HEATED TITANIUM AND TUNGSTEN SURFACES
INGRAHAM, TR
PIDGEON, LM
[J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1952, 30 (09): : 694 - 697
[5] EPITAXIAL GROWTH OF SILICON
LI, CH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (10) : 952 - 957
[6] POWELL CF, 1966, VAPOR DEPOSITION, P269
[7] POWELL CF, 1955, VAPOR PLATING
[8] RUNNALS OJC, 1952, METALS, V4, P843
[9] The demonstration of pure titanium-, circonium-, hafnium- and thorium metal
van Arkel, AE
de Boer, JH
[J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1925, 148 (04): : 345 - 350