INSITU INVESTIGATION OF TIN FORMATION ON TOP OF TISI2

被引：55

作者：

WILLEMSEN, MFC

KUIPER, AET

READER, AH

HOKKE, R

BARBOUR, JC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584052

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：53 / 61

页数：9

共 14 条

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[5]

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