CRITICAL CURRENT DENSITIES OF HIGH-PRESSURE OXYGEN SPUTTERED THIN-FILMS OF YBA2CU3O7-X BY NONRESONANT RF ABSORPTION METHOD

被引：3

作者：

SRINIVASU, VV ^{[1
]}

BHAT, SV ^{[1
]}

MURALIDHAR, GK ^{[1
]}

RAO, GM ^{[1
]}

MOHAN, S ^{[1
]}

机构：

[1] INDIAN INST SCI,INSTRUMENTAT & SERV UNIT,BANGALORE 560012,KARNATAKA,INDIA

来源：

PRAMANA-JOURNAL OF PHYSICS | 1993年 / 40卷 / 02期

关键词：

OXIDE SUPERCONDUCTORS; THIN FILMS; CRITICAL CURRENT DENSITIES; LOW FIELD RF ABSORPTION; FLUX PINNING;

D O I：

10.1007/BF02847291

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The critical current densities (J(c)) have been measured at 77 K in high pressure oxygen sputtered thin films of YBa2Cu3O7-x superconductor using the non-resonant rf absorption technique. High values of J(c)(approximately 10(5) A/cm2) are observed in these relatively large area (approximately 1-2 CM2) films.

引用

页码：119 / 122

页数：4

共 10 条

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