THE EFFECT OF ELEVATED SOFTBAKE TEMPERATURE ON HIGH-RESOLUTION POSITIVE PHOTORESIST

被引：0
|
作者：
YOON, SF [1 ]
CALZAVARA, M [1 ]
VILLA, PL [1 ]
DEGIORGIS, G [1 ]
机构：
[1] SGS THOMSON MICROELECTR,AGRATE BRIANZA,ITALY
来源：
SOLID STATE TECHNOLOGY | 1989年 / 32卷 / 02期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：89 / 93
页数：5
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