DIRECT EVIDENCE OF ARSENIC CLUSTERING IN HIGH-DOSE ARSENIC-IMPLANTED SILICON

被引：40

作者：

WU, NR

SADANA, DK

WASHBURN, J

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 08期

关键词：

D O I：

10.1063/1.94917

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：782 / 784

页数：3

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