We report measurements of excited-state lifetimes for Si-H stretching vibrational modes of steps and terraces on chemically prepared, hydrogen-terminated vicinal Si(111) surfaces using picosecond pump-probe surface spectroscopy. The steps present on these vicinal surfaces are shown to play an important role in the vibrational energy relaxation pathways. Three types of vicinal Si(111) surfaces are studied, all having monohydride-terminated terraces but differing in step termination or in step density. Two surfaces are cut along the <112BAR> direction, 9-degrees and 5-degrees from the (111) plane, respectively. Both of these surfaces have dihydride-terminated steps. A third surface is cut 9-degrees from the (111) plane along the <112BAR> direction and has monohydride-terminated steps. Two normal modes of the dihydride-terminated steps show vibrational energy relaxation times of approximately 100 ps [less-than-or-equal-to 80 ps and 130(20) ps, uncertainty in parentheses], while the monohydride-terminated steps relax 10 times more slowly with an 1100(120) ps lifetime. On the dihydride-stepped 9-degrees surface the lifetime of the terrace mode is shortened to 420(40) ps from the flat surface lifetime of 950(100) ps, while on the monohydride-stepped surface the terrace mode lifetime is 820(80) ps. The results are explained by energy transfer between the terrace and the step Si-H modes. The different dynamics on the monohydride- and dihydride-stepped surfaces arise because the short-lifetime dihydride steps act as energy drains, while the long-lifetime monohydride steps do not. Dipole-dipole coupling between the Si-H stretching modes can account for the interadsorbate vibrational energy transfer observed.
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Nakamura, Tsuneyuki
Miyajima, Ken
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Miyajima, Ken
Hirata, Naoyuki
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Hirata, Naoyuki
Matsumoto, Takeshi
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Matsumoto, Takeshi
Morikawa, Yoshitada
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Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Morikawa, Yoshitada
Tada, Hirokazu
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Osaka Univ, Grad Sch Engn Sci, Div Mat Phys, Osaka 5608531, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Tada, Hirokazu
Nakajima, Atsushi
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Keio Univ, Dept Chem, Japan Sci & Technol Agcy, CREST, Tokyo, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Nakamura, Tsuneyuki
Miyajima, Ken
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Miyajima, Ken
Hirata, Naoyuki
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Hirata, Naoyuki
Matsumoto, Takeshi
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Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Matsumoto, Takeshi
Morikawa, Yoshitada
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机构:
Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Morikawa, Yoshitada
Tada, Hirokazu
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Osaka Univ, Grad Sch Engn Sci, Div Mat Phys, Osaka 5608531, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Tada, Hirokazu
Nakajima, Atsushi
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机构:
Keio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
Keio Univ, Dept Chem, Japan Sci & Technol Agcy, CREST, Tokyo, JapanKeio Univ, Fac Sci & Technol, Dept Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan