INSITU GROWTH OF YBA2CU3OX THIN-FILMS BY REACTIVE COSPUTTERING

被引：3

作者：

HAHN, MR

HYLTON, TL

CHAR, K

BEASLEY, MR

KAPITULNIK, A

机构：

[1] Department of Applied Physics, Stanford University, Stanford

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.578070

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have synthesized superconducting YBa2Cu3Ox thin films in situ using magnetron cosputtering with three metallic targets (Y, Ba, Cu). We present details of the sputtering chamber, as well as the growth conditions necessary to obtain superconducting films. We discuss the effects of oxygen and ozone partial pressure, differential pumping, O2-Ar plasma deposition and Ba-Cu alloy targets. We elaborate on our ozone condensing and delivery system. Finally, we describe the difficulties encountered with the deposition system and provide details of possible improvements.

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页码：82 / 86

页数：5

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