Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering

被引：1

作者：

Choi, Kyoon ^{[1
]}

Choi, Eui-Seok ^{[1
]}

Hwang, Jin-Ha ^{[2
]}

Lee, Soo-Hong ^{[3
]}

机构：

[1] KICET Icheon Branch Inst, Gyeonggi Do 467843, South Korea

[2] Hongik Univ, Seoul 121791, South Korea

[3] Sejong Univ, Seoul 143747, South Korea

来源：

JOURNAL OF THE KOREAN CERAMIC SOCIETY | 2007年 / 44卷 / 10期

关键词：

AR coating (anti-reflection coating); Silicon nitride; Solar cell; RF magnetron sputtering;

D O I：

10.4191/kcers.2007.44.1.585

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a Si3N4 target. The best result was obtained at the sputtering condition of 340 W RF power, 5 mtorr Ar atmosphere, 100 degrees C substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index, 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.

引用

页码：585 / 588

页数：4

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