FORMATION KINETICS OF CRSI2 FILMS ON SI SUBSTRATES WITH AND WITHOUT INTERPOSED PD2SI LAYER

被引：60
|
作者：
OLOWOLAFE, JO [1 ]
NICOLET, MA [1 ]
MAYER, JW [1 ]
机构：
[1] CALTECH,PASADENA,CA 91125
来源：
JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 12期
关键词：
D O I：
10.1063/1.322591
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：5182 / 5186
页数：5
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