INFLUENCE OF BEVEL ANGLE AND SURFACE CHARGE ON BREAKDOWN VOLTAGE OF NEGATIVELY BEVELED DIFFUSED P-N-JUNCTIONS

被引:17
作者
BAKOWSKI, M [1 ]
HANSSON, B [1 ]
机构
[1] CHALMERS UNIV TECHNOL,RES LAB ELECTR,S-40220 GOTHENBURG 5,SWEDEN
关键词
D O I
10.1016/0038-1101(75)90136-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:651 / &
相关论文
共 4 条
[1]   DEPLETION LAYER CHARACTERISTICS AT SURFACE OF BEVELED HIGH-VOLTAGE P-N-JUNCTIONS [J].
BAKOWSKI, M ;
LUNDSTROM, KI .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (06) :550-563
[2]   DETERMINATION OF DOPING PROFILE OF A THYRISTOR FROM C-V MEASUREMENTS [J].
BAKOWSKI, M ;
BOLANDER, G ;
AKESSON, C .
INTERNATIONAL JOURNAL OF ELECTRONICS, 1973, 35 (05) :641-653
[3]   FIELD DISTRIBUTION NEAR-SURFACE OF BEVELED P-N-JUNCTIONS IN HIGH-VOLTAGE DEVICES [J].
CORNU, J .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (04) :347-352
[4]   MEASUREMENT OF IONIZATION RATES IN DIFFUSED SILICON P-N JUNCTIONS [J].
VANOVERSTRAETEN, R ;
DEMAN, H .
SOLID-STATE ELECTRONICS, 1970, 13 (05) :583-+