DOSE-DEPENDENT MIXING OF ALAS-GAAS SUPERLATTICES BY SI ION-IMPLANTATION

被引：57
作者：
VENKATESAN, T
SCHWARZ, SA
HWANG, DM
BHAT, R
KOZA, M
YOON, HW
MEI, P
ARAKAWA, Y
YARIV, A
机构：
[1] CALTECH,PASADENA,CA 91125
[2] RUTGERS STATE UNIV,SURFACE MODIFICAT & INTERFACE DYNAM,PISCATAWAY,NJ 08854
[3] BELL COMMUN RES INC,MURRAY HILL,NJ 07974
来源：
APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 12期
关键词：
D O I：
10.1063/1.97635
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：701 / 703
页数：3
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