AVALANCHE BUILDUP TIME OF SILICON AVALANCHE PHOTODIODES

被引:22
作者
KANEDA, T [1 ]
TAKANASHI, H [1 ]
机构
[1] FUJITSU LABS,NAKAHARA,KAWASAKI,JAPAN
关键词
D O I
10.1063/1.88010
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:642 / 644
页数:3
相关论文
共 6 条
[1]   FREQUENCY RESPONSE OF AVALANCHING PHOTODIODES [J].
EMMONS, RB ;
LUCOVSKY, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (03) :297-+
[2]   AVALANCHE BUILT-UP TIME OF GERMANIUM AVALANCHE PHOTODIODE [J].
KANEDA, T ;
TAKANASHI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (07) :1091-1092
[3]   QUASISTATIC APPROXIMATION FOR SEMICONDUCTOR AVALANCHES [J].
KUVAS, R ;
LEE, CA .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (04) :1743-&
[4]   TIME DEPENDENCE OF AVALANCHE PROCESSES IN SILICON [J].
LEE, CA ;
BATDORF, RL ;
WIEGMANN, W ;
KAMINSKY, G .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (07) :2787-&
[5]   A PROPOSED HIGH-FREQUENCY, NEGATIVE-RESISTANCE DIODE [J].
READ, WT .
BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (02) :401-446
[6]  
WEBB PP, 1974, RCA REV, V35, P234