FORMATION OF THIN-FILMS OF COSI2 - NUCLEATION AND DIFFUSION MECHANISMS

被引：183
作者：
DHEURLE, FM [1 ]
PETERSSON, CS [1 ]
机构：
[1] ROYAL INST TECHNOL,INST MICROWAVE TECHNOL,S-10044 STOCKHOLM 70,SWEDEN
来源：
THIN SOLID FILMS | 1985年 / 128卷 / 3-4期
关键词：
D O I：
10.1016/0040-6090(85)90080-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：283 / 297
页数：15
相关论文
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