IMPROVEMENT OF DEFOCUS TOLERANCE IN A HALF-MICRON OPTICAL LITHOGRAPHY BY THE FOCUS LATITUDE ENHANCEMENT EXPOSURE METHOD - SIMULATION AND EXPERIMENT

被引：21
作者：
FUKUDA, H
HASEGAWA, N
OKAZAKI, S
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期
关键词：
D O I：
10.1116/1.584623
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：667 / 674
页数：8
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