ELECTRICAL-PROPERTIES OF SHALLOW IMPLANTED LAYERS IN SILICON

被引:2
|
作者
MUKASHEV, BN
KUSAINOV, ZA
NUSUPOV, KK
TOKMOLDIN, SZ
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1983年 / 78卷 / 01期
关键词
D O I
10.1002/pssa.2210780146
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:K19 / K22
页数:4
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