THE INFLUENCE OF SUBSTRATE-TEMPERATURE AND SPUTTERING GAS ATMOSPHERE ON THE ELECTRICAL-PROPERTIES OF REACTIVELY SPUTTERED INDIUM TIN OXIDE-FILMS

被引：21
作者：
NISHIKAWA, S
机构：
来源：
THIN SOLID FILMS | 1986年 / 135卷 / 02期
关键词：
D O I：
10.1016/0040-6090(86)90129-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：219 / 228
页数：10
相关论文
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