SURFACE VS GAS-PHASE PROCESSES IN THE MOCVD OF GAAS

被引:0
|
作者
BALK, P
BRAUERS, A
机构
关键词
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:179 / 189
页数:11
相关论文
共 50 条
  • [41] VERTICAL VERSUS HORIZONTAL REACTOR - AN OPTICAL STUDY OF THE GAS-PHASE IN A MOCVD REACTOR
    STOCK, L
    RICHTER, W
    JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) : 144 - 150
  • [42] FLUORESCENCE DETECTION OF THE GAS-PHASE PHOTOFRAGMENTS OF THE MOCVD PRECURSOR CHROMIUM(III) HEXAFLUOROACETYLACETONATE
    HANNA, SD
    ZINK, JI
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 305 - INOR
  • [43] GAS-PHASE COMPOSITION AND EXTRANEOUS DEPOSITION IN GAAS VAPOR EPITAXY
    SHAW, DW
    JOURNAL OF CRYSTAL GROWTH, 1976, 35 (01) : 1 - 9
  • [44] SURFACE AND GAS-PHASE RESISTANCES TO EVAPORATION OF DROPLETS
    ZUNG, JT
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1975, 170 (AUG24): : 71 - 71
  • [45] Gas-phase surface fluorination of arabinoxylan films
    Gröndahl, M
    Gustafsson, A
    Gatenholm, P
    MACROMOLECULES, 2006, 39 (07) : 2718 - 2721
  • [46] MODELING STUDIES OF GAS-PHASE PROCESSES IN OXCO REACTORS
    MACKIE, JC
    NELSON, PF
    NATURAL GAS CONVERSION II, 1994, 81 : 137 - 142
  • [47] SURFACE AND GAS-PHASE RESISTANCES TO EVAPORATION OF DROPLETS
    ZUNG, JT
    ENVIRONMENTAL LETTERS, 1975, 8 (04): : 283 - 296
  • [48] Scalable gas-phase processes to create nanostructured particles
    van Ommen, J. Ruud
    Yurteri, Caner U.
    Ellis, Naoko
    Kelder, Erik M.
    PARTICUOLOGY, 2010, 8 (06) : 572 - 577
  • [49] RADICAL REARRANGEMENT IN GAS-PHASE OXIDATION AND RELATED PROCESSES
    FISH, A
    QUARTERLY REVIEWS, 1964, 18 (03): : 243 - 269
  • [50] RADIOLYTIC PROCESSES IN MIXTURES OF CYCLOBUTANE AND PERFLUOROCYCLOBUTANE IN GAS-PHASE
    HECKEL, E
    HANRAHAN, RJ
    INTERNATIONAL JOURNAL FOR RADIATION PHYSICS AND CHEMISTRY, 1973, 5 (03): : 281 - 291